About this product

Wash away dirt, oil, and impurities while hydrating your skin with Hada Labo Tokyo™ Gentle Hydrating Facial Cleanser for sensitive skin.

This ultra-gentle foaming facial cleanser contains Hyaluronic Acid Plus, which provides more hydration than regular Hyaluronic Acid to help maintain skin's natural hydrating levels. 

The creamy foaming action of this Japanese cleanser locks in skin's essential moisture and washes away easily with no residue, leaving your face feeling clean, refreshed, silky smooth and healthy looking.

Suitable for all skin types, this paraben-free moisturizing cleanser also contains no fragrances, alcohol, sulfates, dyes, mineral oil or soap.

Use this gentle foaming face cleanser every morning and night to help maintain your skin's natural moisture. 

Benefits

• Hyaluronic Acid Plus provides twice the hydration as regular Hyaluronic Acid.

• Ultra-gentle hydrating cleanser washes away dirt, oil and impurities.

• Sensitive skin facial cleanser creates a soothing soft foam and rinses easily with no residue.

• Facial cleanser for sensitive skin and contains no fragrance, parabens, dyes or mineral oil.

Directions

1. Use every morning and evening.

2. Moisten face and hands with lukewarm water. Apply a pea-size amount into alm and work into lather.

3. Gently massage onto face, using circular motion. 

4. Rinse and pat dry.

Two Types of Hyaluronic Acids: Lock in essential moisture

-Natural Amino Acids: For gentle cleansing

-Conditioning Agents: Soften the skin

Ingredients

sodium cocoyl glycinate, glycerin, cocamidopropyl betaine, butylene glycol, potassium cocoyl glycinate, hydroxypropyl starch phosphate, decyl glucoside, PEG-400, water, sodium lauroyl aspartate, BHT, citric acid, disodium EDTA, glyceryl stearate SE, hydroxypropyl methylcellulose, hydroxypropyltrimonium hyaluronate, lauric acid, methylisothiazolinone, mica, PEG-32, phenoxyethanol, polyquaternium-7, polyquaternium-52, sodium acetylated hyaluronate, sodium stearoyl glutamate, stearic acid, titanium dioxide.